Mask inspection DNIR placement based on location of tri-tone level database images (2P shapes)

A system for mask inspection comprising:

• a mask containing intentionally induced defects;
• write data including identifications of first locations for said intentionally induced defects and second locations for predefined do not inspect regions on said mask;
• an analysis component;
• a software component running on said analysis component that translates said first locations into a first set of logic for finite shapes representing do not inspect regions for said intentionally induced defects, translates said second locations into a second set of logic for finite shapes representing predefined do not inspect regions, determines if said first and second sets of logic violate a processing rule of said inspection tool prior to the actual inspection of the mask for any defects, and if said processing rule is violated, generates a single contiguous do not inspect region by overlapping selected logic from said first and second sets of logic prior to said actual inspection;
• and
• an inspection tool that uses said first and second sets of logic, along with any single contiguous do not inspect regions, to inspect said mask for unintentional defects while avoiding said intentionally induced defects and said predefined do not inspect regions.

A program storage device readable by a machine, tangibly embodying a program of instructions executable by the machine to perform method steps for mask inspection, said method comprising:

• identifying a location of an intentionally induced defect on a mask;
• converting said location of said intentionally induced defect to a first finite geometrical shape that represents a first do not inspect region of said mask;
• providing a second finite geometrical shape that represents a second do not inspect region of said mask;
• validating said first finite geometrical shape to ensure that said first finite geometrical shape entirely covers said location of said intentionally induced defect on said mask prior to inspecting said mask;
• and
• inspecting said mask using said validated first finite geometrical shape and said second finite geometrical shape that each represent do not inspect regions such that an inspection tool is able to detect unintentional defects on said mask while avoiding said intentionally induced defects and said predefined do not inspect regions.