Transfer characteristic calculation apparatus, transfer characteristic calculation method, and exposure apparatus

A device manufacturing method comprising steps of:

• preparing a substrate on which a latent image pattern is formed;
• and
• developing the latent image patter,
• wherein the preparing step includes steps of:
• (i) generating a second signal by converting a first signal obtained by stretching an impulse signal on a space axis into a positive value;
• (ii) obtaining an image that is output from the imaging optical system as an output signal when a light intensity distribution is input as the second signal;
• and
• (iii) calculating the transfer characteristic of the imaging optical system by convolution of a third signal with a fourth signal that is obtained by canceling a bias component of the output signal obtained by the sensor, the third signal being an impulse signal upon convolution with the first signal.

A transfer characteristic calculation method of calculating a transfer characteristic of an imaging optical system, said method comprising steps of:

• generating a second signal by converting a first signal obtained by stretching an impulse signal on a space axis into a positive value;
• obtaining an image that is output from the imaging optical system as an output signal when a light intensity distribution is input as the second signal;
• and
• calculating the transfer characteristic of the imaging optical system by convolution of a third signal with a fourth signal that is obtained by canceling a bias component of the output signal obtained by the sensor, the third signal being an impulse signal upon convolution with the first signal.