Manufacturing method of semiconductor device

A manufacturing method of a semiconductor device, comprising the steps of:

• preparing a mother chip and a daughter chip, the mother chip including,
• first and second electrodes, and
• a passivation film formed on a substrate and having openings exposing upper surfaces of the first and second electrodes;
• forming metal layers on the upper surfaces of the first and second electrodes, respectively;
• each metal layer includes
• barrier metal formed on the upper surface of the corresponding electrode and on the passivation film, and
• a metal post formed on the barrier metal;
• forming solder balls on the metal posts of the metal layers formed on the first electrodes so that the solder balls are located above the first electrodes;
• making flip chip bonding of a daughter chip on a circuit face of the mother chip to electrically connect the daughter chip to the metal posts of the metal layers formed on the second electrodes after the step of forming solder balls;
• and
• making flip chip bonding of the mother chip on a circuit board by using the solder balls.