Solid-state imaging device and production method therefor

A solid state imaging device comprising:

• a plurality of light-receiving sections which are disposed in a substrate and which generate charge in response to incident light;
• a planarizing layer which covers predetermined elements disposed on the substrate to perform planarization;
• a plurality of signal lines disposed above the planarizing layer;
• and
• a waveguide which guides incident light to each of the light-receiving sections, the waveguide passing through the space between the plurality of signal lines,
• wherein,
• the waveguide comprises a light-transmissive film having a relatively high refractive index,
• the light-transmissive film is embedded in a hole formed by etching an insulating film having a relatively low refractive index,
• the light-transmissive film includes a first material portion containing at least hydrogen,
• the light receiving section contains hydrogen released from the first material portion by heat treatment in a hydrogen atmosphere, and
• the first material portion has an opening at the top, and a second material portion having a refractive index lower than that of the first material portion is disposed in the opening.