Contamination barrier and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorArnoud Cornelis Wassink
Life of this patent
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Abstract
A rotatable contamination barrier is disclosed. The barrier includes a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source. The blades are oriented radially relative to a central rotation axis of the contamination barrier. The contamination barrier is segmented in an inner segment and an outer segment relative to the central rotation axis. Accordingly, higher revolution speeds may be attained without compromising the contamination barrier.
Claims12
A rotatable contamination barrier for use in an EUV radiation system, the contamination barrier comprising a plurality of closely packed blades for trapping contaminant material coming from an EUV radiation source, the blades being oriented radially relative to a central rotation axis of the contamination barrier, the contamination barrier being segmented in an inner segment and an outer segment relative to the central rotation axis.
A lithographic apparatus comprising:
- a radiation system comprising an EUV radiation source for providing an EUV beam of radiation, and a rotatable contamination barrier comprising a plurality of closely packed blades for trapping contaminant material coming from the EUV radiation source, the blades being oriented radially relative to a central rotation axis of the contamination barrier, the contamination barrier being segmented in an inner segment and an outer segment relative to the central rotation axis;
- a support constructed to support a patterning device, the patterning device being capable of imparting the beam of radiation with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
Dependencies are inferred from the claim text.