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US 7,442,627 B2Granted
Transparent conductive layer forming method, transparent conductive layer formed by the method, and material comprising the layer
AssigneeKonica Corporation
InventorsToshio Tsuji, Hiroto Itoh, Takakazu Kiyomura
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Abstract
A transparent conductive layer forming method is disclosed which comprises the steps of introducing a reactive gas to a discharge space, exciting the reactive gas in a plasma state by discharge at atmospheric pressure or at approximately atmospheric pressure, and exposing a substrate to the reactive gas in a plasma state to form a transparent conductive layer on the substrate, wherein the reactive gas comprises a reducing gas.
Claims9
A transparent conductive layer forming method comprising the steps of:
- introducing a reactive gas to a discharge space;
- exciting the reactive gas in a plasma state by discharge at atmospheric pressure or at approximately atmospheric pressure;
- and
- exposing a substrate to the reactive gas in a plasma state to form a transparent conductive layer on the substrate, wherein the reactive gas comprises a reducing gas.
1 more element
Dependencies are inferred from the claim text.