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US 7,442,615 B2Granted
Semiconductor processing system and method
AssigneeTegal Corporation
InventorsTue Nguyen, Tai Dung Nguyen, Craig Alan Bercaw
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Abstract
Systems and methods are disclosed to perform semiconductor processing with a process chamber; a flash lamp adapted to be repetitively triggered; and a controller coupled to the control input of the flash lamp to trigger the flash lamp. The system can deploy a solid state plasma source in parallel with the flash lamp in wafer processing.
Claims20
A method to deposit a film in a processing chamber, comprising:
- (a) introducing a first precursor to deposit a thin layer, the deposition process is not self-limiting wherein the deposition thickness increases with deposition time;
- and
- (b) triggering a flash lamp to generate thermal energy and triggering a plasma source to generate a plasma energy to modify the deposited layer.
A method to deposit a film in a processing chamber, comprising:
- (a) introducing a first precursor to deposit a thin layer, the deposition process is not self-limiting wherein the deposition thickness increases with deposition time;
- and
- (b) introducing a second precursor comprising process gases selected from a group consisting of nitrogen, oxygen, hydrogen, ammonia, NF3, silane, ozone, argon;
- and
- (c) either
- triggering a flash lamp to generate thermal energy to modify the deposited layer;
- or
- triggering a plasma source to generate a plasma energy to modify the deposited layer;
- or
- triggering a flash lamp to generate thermal energy and triggering a plasma source to generate a plasma energy to modify the deposited layer.
7 more elements
A method to deposit a film in a processing chamber, comprising:
- (a) introducing a first precursor to deposit a thin layer, the deposition process is not self-limiting wherein the deposition thickness increases with deposition time;
- (b) triggering a flash lamp to generate thermal energy;
- and
- (c) triggering a plasma source to generate a plasma energy to modify the deposited layer;
- wherein triggering the flash lamp and triggering the plasma source are performed either sequentially or contemporaneously.
2 more elements
Dependencies are inferred from the claim text.