Semiconductor probe with resistive tip and method of fabricating the same, and information recording apparatus, information reproducing apparatus, and information measuring apparatus having the semiconductor probe

A method of fabricating a semiconductor probe, the method comprising:

• forming a resistive layer on a substrate by lightly doping the surface of the substrate doped with first impurities, with second impurities that are different from the first impurities in polarity;
• forming a mask layer having a predetermined shape on the resistive layer and heavily doping areas of the substrate except the region masked by the mask layer with the second impurities to form first and second semiconductor electrode areas;
• coating a photoresist having a predetermined shape on the mask layer so as to be perpendicular to the mask layer and performing an etching process to make the mask layer into a predetermined shape;
• and
• etching the areas of the substrate except the region masked by the mask layer and performing a thermal oxidation process to form the tip of the semiconductor probe.