Method for fabricating transflective liquid crystal display

A method for fabricating a transflective liquid crystal display, the transflective liquid crystal display comprising a semi-fabricated substrate, the substrate comprising a transmission region and a reflection region, the method comprising:

• forming a transparent electrode layer, a buffer layer, and a reflective metal layer on the substrate;
• forming a photo-resist layer on the reflective metal layer;
• providing a photo-mask comprising a first portion corresponding to the transmission region of the substrate and a second portion corresponding to the reflection region of the substrate, transmittance of the first portion being greater than transmittance of the second portion;
• exposing the photo-resist layer using the photo-mask and developing the exposed photo-resist layer, such that a thickness of residual photo-resist in the reflection region is greater than a thickness of residual photo-resist in the transmission region;
• ashing the residual photo-resist in the transparent region;
• etching the reflective metal layer and the buffer layer in the transmission region to expose the transparent electrode layer in the transparent region;
• and
• removing the residual photo-resist in the reflection region to expose the reflective metal layer in the reflection region.