Method of treating surface of substrate used in biological reaction system
AssigneeSamsung Electronics Co., Ltd.
InventorsSun-hee Kim, Soo-suk Lee, Geun-bae Lim, Young-sun Lee
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Abstract
Provided is a method of treating a surface of a substrate used in a biochemical reaction system, the method including forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below: (RO)3—Si—(CH2)n1—X (1) (RO)3—Si—(CH2)n2—(CF2)m—X (2) wherein R is one of a methyl group and an ethyl group, X is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10.
Claims2
A method of treating a surface of a substrate for a biochemical reaction system, the method comprising forming a polymer film on the surface by vapor deposition of a compound of formula (1) below and a compound of formula (2) below:
- (RO)3—Si—CH2)n1—X (1)
- (RO)3—Si—(CH2)n2—(CF2)m—X (2)
- wherein R is one of a methyl group and an ethyl group, X in formula (1) is a methyl group, while X in formula (2) is one of a methyl group and a trifluoromethyl group, n1 is an integer from 1 to 3, n2 is an integer from 1 to 10, and m is an integer from 1 to 10,
- wherein the film is formed directly on the substrate, which is made of silicon and has silanol groups,
- wherein the compound of said formula (1) and the compound of said formula (2) are simultaneously or sequentially deposited by vaporization.
Dependencies are inferred from the claim text.