Positive resist composition and pattern formation method using the positive resist composition
AssigneeFUJIFILM Corporation
InventorsKaoru Iwato, Kunihiko Kodama
Life of this patent
Estimating the term…
Abstract
A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decomposable group; a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a second acid-decomposable group which is different from the first acid-decomposable group; a compound which generates an acid upon irradiation of an actinic ray or a radiation; and a solvent.
Claims9
A positive resist composition comprising:
- a first resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decomposable group;
- a second resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a second acid-decomposable group which is different from the first acid-decomposable group;
- a compound which generates an acid upon irradiation of an actinic ray or a radiation;
- and
- a solvent.
Dependencies are inferred from the claim text.