Gas barrier substrate
AssigneeDai Nippon Printing Co., Ltd.
InventorsSayaka Kawashima, Minoru Komada, Keiji Tokunaga
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Abstract
The main object of the present invention is to provide a gas barrier substrate having a high gas barrier property without a ruggedness, a pin hole or the like in the gas barrier layer. The present invention solves the problem by providing a gas barrier substrate having a base material, a planarization layer formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer.
Claims7
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein the base material is made of a heat resistant transparent resin having 80 ppm or less of coefficient of thermal expansion in the range from a room temperature to 150° C., and 85% or more of overall optical transmittance.
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein the base material has a heat resistant transparent resin layer having 80 ppm or less of coefficient of thermal expansion in the range from a room temperature to 150° C. and a 85% or more of overall optical transmittance of the surface.
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein the average surface roughness of the planarization layer is 6 nm or less, and the maximum height difference of surface (peak to valley) is 60 nm or less.
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein the oxygen transmission rate in the gas barrier substrate is 0.3 cc/m2/day or less.
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein the average roughness of the gas barrier substrate is 6 nm or less, and the maximum height difference of surface (peak to valley) is 60 nm or less.
A gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer,
- wherein a stress releasing layer for releasing the stress applied on the base material is formed on the opposite surface where the gas barrier layer and the planarization layer are formed.
A display substrate comprising a transparent electrode layer formed on a gas barrier substrate having a base material, a planarization layer having a cardo polymer and formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer.
Dependencies are inferred from the claim text.