Electronic device, electron source and manufacturing method for electronic device
AssigneeCanon Kabushiki Kaisha
InventorsKazuo Kuroda, Noriaki Ohguri, Toshifumi Yoshioka, Takeo Tsukamoto, Yoshio Suzuki
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Abstract
To provide an antistatic film that requires low power consumption and provides satisfactory electric contact, as a measure for preventing an insulating substrate surface having an electronic device formed thereon from being charged. The electronic device includes: an insulating substrate; a conductor; and a resistance film connected with the conductor, the conductor and the resistance film being formed on the insulating substrate, characterized in that the resistance film has a larger thickness in a connection region with the conductor than a thickness in portions other than the connection region.
Claims1
A manufacturing method for an electronic device substrate, comprising:
- forming a plurality of electron-emitting devices and a plurality of porous wirings for driving the plurality of electron-emitting devices on a part of an insulating substrate;
- applying a solution containing electroconductive material or precursor onto a surface of the insulating substrate having the plurality of electron-emitting devices and the plurality of porous wirings formed thereon so that an amount of the solution is equal to or larger than a saturation point of the porous wiring;
- and
- drying the solution containing electroconductive material or precursor to thereby form an antistatic film extending over the plurality of porous wirings and the surface of the insulating substrate,
- so that the antistatic film has a thickness lesser than at a portion thereof on the electron-emitting device, and greater at a portion thereof connected with the porous wiring.
Dependencies are inferred from the claim text.