Plasma etching method and apparatus therefor
AssigneeTokyo Electron Limited
InventorKoji Maruyama
Life of this patent
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Abstract
A fluorine-containing compound gas, e.g., SF6 gas, is converted into a plasma and a silicon portion of an object to be processed is etched by the plasma. At the same time, using a light source having a peak intensity of light in a wavelength range of light absorption of a reaction product, e.g., SiF4, for which, to be more precise, ranges from 9 μm to 10 μm, the light is irradiated onto a surface of an object to be processed from the light source. The SiF4 molecules absorb the light, become activated and gain kinetic energy to be used in gaining an easy escape from a hole. As a consequence, an amount (a partial pressure) of fluorine radicals (F*) used as an etchant is increased and an etching rate of a silicon is increased.
Claims18
A plasma etching apparatus comprising:
- a plasma generating unit that produces a plasma which etches a silicon portion of an object to be processed mounted on a susceptor, the plasma being obtained by converting a process gas including a fluorine-containing compound gas in an airtight process chamber,
- a light source which emits a light having peak intensity of light in a wavelength range of light absorption of a reaction product produced by a reaction between the fluorine-containing compound gas and the silicon portion during an etching process, and irradiates the light onto a surface of the object to be processed mounted on the susceptor;
- and
- a gas supply unit introducing the process gas into the process chamber,
- wherein the gas supply unit includes a plurality of light transmitting windows for transmitting the light from the light source into the process chamber, the light transmitting windows being formed in a surface of the gas supply unit facing the susceptor and in a surface of the gas supply unit facing the light source, and
- wherein the light is irradiated uniformly onto the whole surface of the object through the light transmitting windows.
A plasma etching apparatus comprising:
- a plasma generating unit that produces a plasma of a process gas for etching an object to be processed mounted on a susceptor in an airtight process chamber,
- a light source which emits a light having a peak intensity in a wavelength range of light absorption of a reaction product produced by a reaction between the plasma and the object during an etching process, the light source being disposed outside the process chamber;
- and
- a gas shower head formed at a ceiling portion in the process chamber, the shower head including a number of gas inlet holes for introducing the process gas into the process chamber and a plurality of light transmitting windows for irradiating the light onto an upper surface of the object, the light transmitting windows being formed in a surface of the gas shower head facing the susceptor and in a surface of the gas shower head facing the light source, and
- wherein the light is irradiated uniformly onto the whole upper surface of the object through the light transmitting windows and the reaction product is activated by absorbing the light to thereby attain an increased kinetic energy helping escape of the reaction product from an etched feature of the object.
Dependencies are inferred from the claim text.