Hard films, multilayer hard films, and production methods thereof
AssigneeKabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.)
InventorKenji Yamamoto
Life of this patent
Estimating the term…
Abstract
A hard film contains [(Nb1-d,Tad)aAl1-a](C1-xNx), [(Nb1-d,Tad)a,Al1-a-b-c,Sib,Bc](C1-xNx), [(Cr,V)p(Nb,Ta)q(Al,Si,B)r](C1-xNx), or [(Ti,Cr,V)p(Nb,Ta)q(Al,Si,B)r](C1-xNx), in which the atomic ratios satisfy the following conditions: 0.4≦a≦0.6, 0<b+c≦0.15, 0≦d≦1, 0.4≦x≦1, provided that one of “b” and “c” may be zero but both of them are not simultaneously zero, p+q+r=1; pTi+pCr+pV=p; qNb+qTa=q; rAl+rsi+rB=r, 0.05≦q, 0.5≦r≦0.73, 0≦rsi+rB≦0.15, and 0.4≦x≦1.0, provided that when pTi is greater than zero, the total of pCr, pV, rSi, and rB is greater than zero.
Claims6
A hard film consisting of [(Nb1-d,Tad)aAl1-a](C1-xNx), wherein “a”, “d”, and “x” each independently represent an atomic ratio and satisfy the following conditions:
- 0.4≦a≦0.6,
- 0≦d≦1, and
- 0.4≦x≦1.
A hard film consisting of [(Nb1-d,Tad)a,Al1-a-b-c,Sib,Bc](C1-xNx), wherein “a”, “b”, “c”, “d”, and “x” each independently represent an atomic ratio and satisfy the following conditions, provided that one of “b” and “c” may be zero but both of them are not simultaneously zero:
- 0.4≦a≦0.6,
- 0<b+c≦0.15,
- 0≦d≦1, and
- 0.4≦x≦1.
A hard film deposited by cathode-discharge arc ion plating in a nitrogen-containing gas or a gaseous mixture containing carbon and nitrogen using:
- a target consisting of [(Nb1-d,Tad)aAl1-a], wherein “a” and “d” each independently represent an atomic ratio and satisfy the following conditions:
- 0.4≦a≦0.6, 0≦d≦1, or
- a target consisting of [(Nb1-d,Tad)a,Al1-a-b-c,Sib,Bc], wherein “a”, “b”, “c”, and “d” each independently represent an atomic ratio and satisfy the following conditions:
- 0.4≦a≦0.6, 0≦b+c≦0.15, 0≦d≦1, provided that one of “b” and “c” may be zero but both of them are not simultaneously zero.
A hard film consisting of [(Cr,V)p(Nb,Ta)q(Al,Si,B)r](C1-xNx) and satisfying following Conditions (1) to (8):
- p+q+r=1 Condition (1)
- pCr+pV=p Condition (2)
- qNb+qTa=q Condition (3)
- rAl+rsi+rB=r Condition (4)
- 0.05≦q Condition (5)
- 0.5≦r≦0.73 Condition (6)
- 0≦rsi+rB≦0.15 Condition (7)
- 0.4≦x≦1.0 Condition (8)
- wherein pCr represents the atomic ratio of Cr;
- pV represents the atomic ratio of V;
- qNb represents the atomic ratio of Nb;
- qTa represents the atomic ratio of Ta;
- rAl represents the atomic ratio of Al;
- rSi represents the atomic ratio of Si;
- rB represents the atomic ratio of B;
- and x represents the atomic ratio of N.
A hard film consisting of [(Ti,Cr,V)p(Nb,Ta)q(Al,Si,B)r](C1-xNx) and satisfying following Conditions (1A) to (10A):
- p+q+r=1 Condition (1A)
- pTi+pCr+pV=P Condition (2A)
- qNb+qTa=q Condition (3A)
- rAl+rsi+rB=r Condition (4A)
- 0.05≦q Condition (5A)
- 0.5≦r≦0.73 Condition (6A)
- 0≦rsi+rB≦0.15 Condition (7A)
- pTi>0 Condition (8A)
- pCr+pV+rSi+rB>0 Condition (9A)
- 0.4≦x≦1.0 Condition (10A)
- wherein pTi represents the atomic ratio of Ti;
- pCr represents the atomic ratio of Cr;
- pV represents the atomic ratio of V;
- qNb represents the atomic ratio of Nb;
- qTa represents the atomic ratio of Ta;
- rAl represents the atomic ratio of Al;
- rSi represents the atomic ratio of Si;
- rB represents the atomic ratio of B;
- and x represents the atomic ratio of N.
A hard film deposited by cathode-discharge arc ion plating in a nitrogen-containing gas or a gaseous mixture containing carbon and nitrogen using a target consisting of [(Cr,V)p(Nb,Ta)q(Al,Si,B)r] and satisfying following Conditions (1) to (7) or a target consisting of [(Ti,Cr,V)p(Nb,Ta)q(Al,Si,B)r] and satisfying following Conditions (1A) to (9A):
- p+q+r=1 Condition (1)
- pCr+pV=p Condition (2)
- qNb+qTa=q Condition (3)
- rAl+rsi+rB=r Condition (4)
- 0.05≦q Condition (5)
- 0.5≦r≦0.73 Condition (6)
- 0≦rsi+rB≦0.15 Condition (7)
- p+q+r=1 Condition (1A)
- pTi+pCr+pV=p Condition (2A)
- qNb+qTa=q Condition (3A)
- rAl+rsi+rB=r Condition (4A)
- 0.05≦q Condition (5A)
- 0.5≦r≦0.73 Condition (6A)
- 0≦rsi+rB≦0.15 Condition (7A)
- pTi>0 Condition (8A)
- pCr+pV+rSi+rB>0 Condition (9A)
- wherein PTi represents the atomic ratio of Ti;
- pCr represents the atomic ratio of Cr;
- pV represents the atomic ratio of V;
- qNb represents the atomic ratio of Nb;
- qTa represents the atomic ratio of Ta;
- rAl represents the atomic ratio of Al;
- rSi represents the atomic ratio of Si;
- and rB represents the atomic ratio of B.
Dependencies are inferred from the claim text.