Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering target

A method for manufacturing high purity nickel, comprising the steps of:

• partitioning an anode and a cathode of an electrolytic bath with a diaphragm to define an anode side and a cathode side of the electrolytic bath, the anode being made of nickel raw material of a purity of at least 3N (99.9wt %);
• performing electrolysis within the electrolytic bath;
• extracting anolyte intermittently or consecutively from the anolyte side of the electrolytic bath;
• adjusting pH of the extracted anolyte to about 2 to 5;
• eliminating impurity iron contained in the extracted anolyte by adding an oxidizing agent to said extracted anolyte and precipitating said impurity iron as hydroxide;
• eliminating cobalt and copper impurities by at least one of adding the extracted anolyte to a preliminary electrolytic bath to eliminate cobalt and copper impurities through preliminary electrolysis and adding an Ni foil to the extracted anolyte to eliminate cobalt and copper impurities though displacement reaction;
• after said eliminating steps, filtering said extracted anolyte through an activated carbon filter to remove precipitated oxides and provide a substantially impurity-free solution;
• adding the impurity-free solution intermittently or consecutively only to the cathode-side of the electrolytic bath;
• performing electrolytic refining by using a cathode side solution added with said impurity free solution;
• and
• obtaining, without ionic exchange and solvent extraction refining steps, nickel having a purity of at least 5N (99.999 wt %), excluding gas components, in the form of electrolytic nickel deposited to the cathode.