Addressable irradiation of images

A marking system comprising:

• at least one image applying component for applying a marking material to a substrate in forming an image on the substrate, the marking material comprising a radiation sensitive material;
• an addressable first irradiation device which receives the marked substrate from the image applying component, the irradiation device comprising an array of addressable irradiation elements for irradiating the marked substrate, the irradiation device emitting radiation within a range of wavelengths to which the radiation sensitive material is sensitive;
• the array comprising a plurality of rows of elements, which extend generally parallel with the direction of travel of the substrate, each row comprising a plurality of independently addressable elements;
• a secondary irradiation device which receives marked and irradiated substrates from the irradiation device;
• and
• a control system in communication with the secondary irradiation device, the control system determining an appropriate secondary irradiation treatment to reduce a variation in appearance between substrates irradiated by the first irradiation device and substrates irradiated by a second irradiation device.

A marking method comprising:

• applying a marking material to a first substrate to form an image on the substrate, the marking material comprising a radiation sensitive material;
• irradiating the marked first substrate with a first array of addressable irradiation elements, at least a plurality of the irradiation elements emitting radiation in a range of wavelengths within which the radiation sensitive material reacts, the plurality of irradiation elements being selectively actuated;
• applying a marking material to a second substrate to form an image on the substrate, the marking material comprising a radiation sensitive material;
• irradiating the marked second substrate with a second array of addressable irradiation elements, at least a plurality of the irradiation elements emitting radiation in a range of wavelengths within which the radiation sensitive material reacts, the plurality of irradiation elements being selectively actuable;
• and
• irradiating at least one of the marked first and second substrates with a third array of addressable irradiation elements, at least a plurality of the irradiation elements emitting radiation in a range of wavelengths within which the radiation sensitive material reacts, the plurality of irradiation elements being selectively actuable to reduce a variation in appearance between the first and second substrates.