Substrate heat treatment apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsAkihiko Morita, Shigehiro Goto, Keiji Matsuchika
Life of this patent
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Abstract
A substrate heat treatment apparatus for heat-treating a substrate includes a bake plate having projections on an upper surface thereof, a seal unit disposed peripherally of the upper surface of the bake plate for closing a lateral area of a minute space formed between a lower surface of the substrate and the upper surface of the bake plate when the substrate is placed on the bake plate, and exhaust bores for exhausting gas from the minute space. The substrate placed on the bake plate is heat-treated in a state of the gas exhausted from the minute space through the exhaust bores.
Claims20
A substrate heat treatment apparatus for heat-treating a substrate, comprising:
- a bake plate having projections on an upper surface thereof;
- a seal unit disposed peripherally of the upper surface of said bake plate for closing a lateral area of a minute space formed between a lower surface of the substrate and the upper surface of said bake plate when the substrate is placed on said bake plate, said seal unit including a regulator for restricting sideways movement of the substrate and a contact portion having a diameter smaller than an outside diameter of the substrate and spaced from said regulator for contacting the lower surface of the substrate;
- and
- exhaust bores for exhausting gas from said minute space;
- wherein the substrate placed on said bake plate is heat-treated in a state of the gas exhausted from said minute space through said exhaust bores.
A substrate heat treatment apparatus for heat-treating a substrate, comprising:
- a bake plate having projections on an upper surface thereof;
- a seal unit disposed peripherally of the upper surface of said bake plate for closing a lateral area of a minute space formed under a lower surface of the substrate when the substrate is placed on said bake plate, said seal unit including a regulator for restricting sideways movement of the substrate and a contact portion having a diameter smaller than an outside diameter of the substrate and spaced from said regulator for contacting the lower surface of the substrate;
- a porous member disposed on the upper surface of said bake plate inwardly of said seal unit;
- and
- exhaust bores communicating with said porous member for exhausting gas from said minute space;
- wherein the substrate placed on said bake plate is heat-treated in a state of the gas exhausted from said minute space through said exhaust bores.
Dependencies are inferred from the claim text.