Condition assessment system for a structure including a semiconductor material
AssigneeAttofemto, Inc.
InventorPaul L. Pfaff
Life of this patent
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Abstract
An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.
Claims34
A structure including a semiconductor material comprising:
- a target portion and a second portion different from the target portion, the target portion having a first feature when at least one of the following occurs:
- an external force is received by the second portion of the structure and an internal condition occurs in the target portion;
- and
- a hologram or holographic optical element located to produce a first optical interference pattern when the target portion and the hologram or holographic optical element are exposed to non-invasive illumination and when the target portion has the first feature.
A structure including a semiconductor material, the structure having a thickness, the structure comprising:
- a target portion and a second portion different from the target portion, the target portion having a first feature when at least one of the following occurs:
- an external force is received by the second portion of the structure and an internal condition occurs in the target portion;
- a first hologram or holographic optical element;
- and
- a second hologram or holographic optical element spaced apart through the thickness of the structure from the first hologram or holographic optical element, the first hologram or holographic optical element and the second hologram or holographic optical element located to produce a first optical interference pattern when the target portion and the hologram or holographic optical element are exposed to non-invasive illumination and when the target portion has the first feature.
Dependencies are inferred from the claim text.