# US 7,411,658 B2 · Lithographic apparatus and device manufacturing method > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 7,411,658 B2 - Document ID: US7411658B2 - Status: Granted - Kind: B2 - Application number: 11/244,390 - Filed: 2005-10-06 - Published: 2007-04-12 - Granted: 2008-08-12 - Earliest claimed: 2005-10-06 - Assignees: ASML Netherlands B.V. - Inventors: Marcel Beckers; Johannes Henricus Wilhelmus Jacobs; Nicolaas Ten Kate; Ferdy Migchelbrink - Web page: https://patentgrep.com/patent/US7411658B2 ## CPC - G03F 7/70341: {Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041)} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system. ## Claims ### Claim 1 A lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid; and a protrusion which surrounds the projection system and is on the barrier member such that a surface of the protrusion is closer to the projection system than a part of the barrier member on a radially outward side of the protrusion is to the surface of the projection system, or the protrusion is on the projection system such that a surface of the protrusion is closer to the barrier member than a part of the projection system on a radially outward side of the protrusion is to the surface of the barrier member; wherein, in a use, liquid simultaneously contacts the surface of the protrusion and a surface of the projection system facing the surface of the protrusion when the protrusion is on the barrier, or simultaneously contacts the surface of the protrusion and a surface of the barrier member facing the surface of the protrusion when the protrusion is on the projection system. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein if the protrusion is attached to the barrier member the surface of the protrusion is closer to the projection system than a part of a surface of the barrier member on a radially inner side of the protrusion, and if the protrusion is attached to the projection system the surface of the protrusion is closer to the barrier member than a part of the projection system on a radially inner side of the protrusion. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the protrusion is located on a substantially horizontal part of the barrier member. ### Claim 4 (depends on 3) The apparatus of claim 3, wherein the protrusion is located at or in proximity of the radially innermost portion of the horizontal part. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the surface of the protrusion is liquidphobic. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the projection system in proximity to the protrusion has a liquidphobic surface, the barrier member in proximity to the protrusion has a liquidphobic surface, or both. ### Claim 7 (depends on 1) The apparatus of claim 1, wherein, in normal use, the level of liquid in the reservoir does not exceed a point at which a top surface meniscus of the liquid extends between the protrusion and the projection system or between the protrusion and the barrier member. ### Claim 8 (depends on 1) The apparatus of claim 1, wherein the protrusion is positioned to deflect radially inwardly a flow of liquid from a direction of the substrate. ### Claim 9 A lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; and a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid, wherein a surface of the barrier member, a surface of the projection system, or both, is shaped such that there is a step increase in a distance between the two to increase resistance against a meniscus of a liquid when contained in the reservoir passing, between the surface of the barrier member and the surface of the projection system, radially outwardly of that step increase. ### Claim 10 (depends on 9) The apparatus of claim 9, wherein the protrusion is located on a substantially horizontal part of the barrier member. ### Claim 11 (depends on 10) The apparatus of claim 10, wherein the protrusion is located at or in proximity of the radially innermost portion of the horizontal part. ### Claim 12 (depends on 9) The apparatus of claim 9, wherein the surface of the protrusion is liquidphobic. ### Claim 13 (depends on 9) The apparatus of claim 9, wherein the projection system in proximity to the protrusion has a liquidphobic surface, the barrier member in proximity to the protrusion has a liquidphobic surface, or both. ### Claim 14 (depends on 9) The apparatus of claim 9, wherein, in normal use, the level of liquid in the reservoir does not exceed a point at which a top surface meniscus of the liquid extends between the protrusion and the projection system or between the protrusion and the barrier member. ### Claim 15 (depends on 9) The apparatus of claim 9, wherein the protrusion is positioned to deflect radially inwardly a flow of liquid from a direction of the substrate. ### Claim 16 A device manufacturing method comprising projecting a patterned beam of radiation through a liquid onto a substrate using a projection system, wherein the liquid is confined to a reservoir between the projection system and the substrate at least in part by a barrier member and wherein a meniscus of the liquid either extends between a protrusion on the barrier member and the projection system wherein the protrusion is closer to the projection system than a part of the barrier member radially outwardly of the protrusion is to the surface of the projection system, or extends between a protrusion on the projection system and the barrier member wherein the protrusion is closer to the barrier member than a part of the projection system radially outwardly of the protrusion is to the surface of the barrier member. ### Claim 17 (depends on 16) The method of claim 16, wherein if the protrusion is attached to the barrier member the surface of the protrusion is closer to the projection system than a part of a surface of the barrier member on a radially inner side of the protrusion, and if the protrusion is attached to the projection system the surface of the protrusion is closer to the barrier member than a part of the projection system on a radially inner side of the protrusion. ### Claim 18 (depends on 16) The method of claim 16, wherein the protrusion is located on a substantially horizontal part of the barrier member. ### Claim 19 (depends on 18) The method of claim 18, wherein the protrusion is located at or in proximity of the radially innermost portion of the horizontal part. ### Claim 20 (depends on 16) The method of claim 16, wherein the surface of the protrusion is liquidphobic. ### Claim 21 (depends on 16) The method of claim 16, wherein the projection system in proximity to the protrusion has a liquidphobic surface, the barrier member in proximity to the protrusion has a liquidphobic surface, or both. ### Claim 22 (depends on 16) The method of claim 16, wherein, in normal use, the level of liquid in the reservoir does not exceed a point at which a top surface meniscus of the liquid extends between the protrusion and the projection system or between the protrusion and the barrier member. ### Claim 23 (depends on 16) The method of claim 16, wherein the protrusion is positioned to deflect radially inwardly a flow of liquid from a direction of the substrate. ### Claim 24 A device manufacturing method comprising projecting a patterned beam of radiation through a liquid onto a substrate using a projection system wherein the liquid is contained between the projection system and the substrate at least in part by a barrier member, the barrier member, the projection system, or both, shaped such that there is a step increase in a distance between the barrier member and the projection system and a meniscus extends on one side of the step between the barrier member and the projection system. ### Claim 25 (depends on 24) The method of claim 24, wherein the protrusion is located on a substantially horizontal part of the barrier member. ### Claim 26 (depends on 25) The method of claim 25, wherein the protrusion is located at or in proximity of the radially innermost portion of the horizontal part. ### Claim 27 (depends on 24) The method of claim 24, wherein the surface of the protrusion is liquidphobic. ### Claim 28 (depends on 24) The method of claim 24, wherein the projection system in proximity to the protrusion has a liquidphobic surface, the barrier member in proximity to the protrusion has a liquidphobic surface, or both. ### Claim 29 (depends on 24) The method of claim 24, wherein, in normal use, the level of liquid in the reservoir does not exceed a point at which a top surface meniscus of the liquid extends between the protrusion and the projection system or between the protrusion and the barrier member. ### Claim 30 (depends on 24) The method of claim 24, wherein the protrusion is positioned to deflect radially inwardly a flow of liquid from a direction of the substrate. ### Claim 31 A lithographic apparatus, comprising: a projection system configured to project a patterned radiation beam onto a target portion of a substrate; a barrier member, surrounding a space between the projection system and the substrate, to define in part a reservoir for liquid; and a protrusion which surrounds the projection system and is on the projection system such that a surface of the protrusion is closer to the barrier member than a part of the projection system on a radially outward side of the protrusion is to the surface of the barrier member. ### Claim 32 (depends on 31) The apparatus of claim 31, wherein the protrusion is attached to the projection system such that the surface of the protrusion is closer to the barrier member than a part of the projection system on a radially inner side of the protrusion is to the surface of the projection system.