# US 7,410,901 B2 · Submicron device fabrication

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- Number: US 7,410,901 B2
- Document ID: US7410901B2
- Status: Granted
- Kind: B2
- Application number: 11/380,593
- Filed: 2006-04-27
- Published: 2007-11-01
- Granted: 2008-08-12
- Earliest claimed: 2006-04-27
- Assignees: Honeywell International Inc.
- Inventors: Jorg Pilchowski
- Web page: https://patentgrep.com/patent/US7410901B2

## CPC

- B81C 1/00182: {Arrangements of deformable or non-deformable structures, e.g. membrane and cavity for use in a transducer}
- Y10S 977/887: Nanoimprint lithography, i.e. nanostamp
- Y10S 977/888: Shaping or removal of materials, e.g. etching
- Y10S 977/89: Deposition of materials, e.g. coating, cvd, or ald
- Y10S 977/891: Vapor phase deposition
- Y10S 977/892: Liquid phase deposition
- B81C: PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS (making microcapsules or microballoons B01J13/02; processes or apparatus specially adapted for the manufacture or treatment of piezoelectric, electrostrictive or magnetostrictive elements per se H10N30/01)
- Y10S: TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS

## Abstract

A method for fabricating substrate material to include trenches and unreleased beams with submicron dimensions includes etching a first oxide layer on the substrate to define a first set of voids in the first oxide layer to expose the substrate. A second oxide layer is accreted to the first oxide layer to narrow the first set of voids to become a second set of voids on the substrate. A polysilicon layer is deposited over the second oxide layer, the first oxide layer and the substrate. A third set of voids is etched into the polysilicon layer. Further etching widens the third set of voids to define a fourth set of voids to expose the first oxide layer and the substrate. The first oxide layer and the substrate is deeply etched to define beams and trenches in the substrate.

## Claims

### Claim 1

A method for fabricating substrate material to include trenches and unreleased beams with submicron dimensions comprising:
etching a first oxide layer on the substrate to define a first set of voids in the first oxide layer exposing the substrate;
accreting a second oxide layer to narrow the first set of voids;
depositing a polysilicon layer over the second oxide layer, the first oxide layer and the substrate;
etching a second set of voids into the polysilicon layer at distinct structures from the first set of voids;
etching the polysilicon layer to widen the second set of voids to define a third set of voids exposing the first oxide layer and the substrate; and
etching the first oxide layer and the substrate to define beams and trenches in the substrate.

### Claim 2 (depends on 1)

The method of claim 1, wherein etching the first oxide layer on the substrate to define the first set of voids in the first oxide layer exposing the substrate includes:
thermally oxidizing the first oxide layer on the substrate;
applying a first mask in a first mask pattern to the first oxide layer selectively exposing the first oxide layer;
etching the first mask pattern into the first oxide layer to expose the substrate; and
removing the first mask to expose the first oxide layer.

### Claim 3 (depends on 1)

The method of claim 1, wherein accreting the second oxide layer to narrow the first set of voids to become the second set of voids on the substrate includes:
thermally oxidizing a second oxide layer on the first oxide layer and on the exposed substrate; and
etching the second oxide layer to expose the first oxide layer and the substrate.

### Claim 4 (depends on 1)

The method of claim 1, wherein etching the third set of voids into the polysilicon layer includes:
applying a second mask onto the polysilicon layer to form a second mask pattern selectively exposing the polysilicon layer;
thermally oxidizing the polysilicon layer;
etching the exposed oxidized polysilicon layer to expose the substrate; and
removing the second mask pattern.

### Claim 5 (depends on 1)

The method of claim 1, wherein:
etching the polysilicon layer and the substrate layer to expose the first oxide layer and the substrate further includes:
depositing a metal layer uniformly across the polysilicon layer and substrate;
applying a third mask in a third masking pattern to selectively expose the metal layer;
etching the exposed metal layer exposing the oxide layer and the substrate; and
etching the oxide layer and the substrate layer; and
etching the substrate to define beams and trenches in the substrate includes:
removing the third masking layer.