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US 7,410,544 B2Granted
Method for cleaning electroless process tank
AssigneeFreescale Semiconductor, Inc.
InventorsSam S. Garcia, Edward Acosta, Varughese Mathew
Life of this patent
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Abstract
A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107).
Claims19
A method for removing metal deposits from a tank, comprising:
- exposing the tank to a metal plating solution, thereby forming metal deposits on a surface of the tank;
- and
- removing the metal deposits through a process comprising
- (a) exposing the tank to a first solution containing a first acid;
- and
- (b) exposing the tank to a second solution containing a second acid and a first oxidizing agent, wherein the first and second solutions have different compositions.
3 more elements
A method for removing metal plating solution deposits from a component of a metal plating system, comprising:
- exposing the component to a metal plating solution, thereby forming metal deposits on the component;
- and
- removing the metal deposits through a process comprising
- (a) subjecting the component to a first aqueous rinse,
- (b) exposing the component to a first solution comprising a first acid,
- (c) exposing the component to a second solution comprising a second acid and a first oxidizing agent, wherein the first and second acids are different, and wherein the first and second solutions have different compositions,
- (e) subjecting the component to a second aqueous rinse, and
- (f) exposing the component to a third solution comprising a second oxidizing agent.
5 more elements
A method for removing metal deposits from a metal plating tank, comprising:
- exposing the tank to a metal plating solution, thereby forming metal deposits on a surface of the tank;
- and
- removing the metal deposits through a process comprising
- (a) subjecting the tank to a first aqueous rinse,
- (b) exposing the tank to a first solution comprising nitric acid,
- (c) subjecting the tank to a second aqueous rinse,
- (d) exposing the tank to a second solution comprising hydrochloric acid and hydrogen peroxide, wherein the first and second solutions have different compositions,
- (e) subjecting the tank to a third aqueous rinse,
- (f) exposing the tank to a third solution comprising hydrogen peroxide, and
- (g) subjecting the tank to a fourth aqueous rinse.
7 more elements
Dependencies are inferred from the claim text.