# US 7,408,002 B2 · Photosensitive resin composition and process for the formation of hydrogel

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- Number: US 7,408,002 B2
- Document ID: US7408002B2
- Status: Granted
- Kind: B2
- Application number: 10/535,045
- Filed: 2003-11-13
- Published: 2006-02-23
- Granted: 2008-08-05
- Earliest claimed: 2002-11-14
- Assignees: Toyo Gosei Co., Ltd.
- Inventors: Shin Utsunomiya; Seigo Yamada; Masahiro Takano; Mitsuharu Miyazaki
- Web page: https://patentgrep.com/patent/US7408002B2

## CPC

- G03F 7/0388: {with ethylenic or acetylenic bands in the side chains of the photopolymer}
- C08F 8/14: Esterification
- C08F 265/02: on to polymers of acids, salts or anhydrides
- C08F 290/126: {Polymers of unsaturated carboxylic acids or derivatives thereof}
- C08F 299/00: Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08L 51/003: {grafted on to macromolecular compounds obtained by reactions only involving unsaturated carbon-to-carbon bonds (C08L51/04, C08L51/06 take precedence)}
- C08F 2810/30: leading to the formation or introduction of aliphatic or alicyclic unsaturated groups
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08F: MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08L: COMPOSITIONS OF MACROMOLECULAR COMPOUNDS (compositions based on polymerisable monomers C08F, C08G; artificial filaments or fibres D01F; textile treating compositions D06)

## Abstract

The photosensitive resin composition is composed of a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin (A) having an acid value of 150 mgKOH/g or more on a solid basis; the resin (A) being formed of a ((meth)acrylic acid)-based polymer in which a compound represented by formula (1): (wherein R1 represents H or Me; and R2 represents a liner or branched C2-C10 alkylene group) has been added to portions of the carboxylic groups, a photopolymerization initiator (B); and water (C).

## Claims

### Claim 1

A method for forming a hydrogel by subjecting a photosensitive resin composition to photopolymerization, the photosensitive resin composition comprising
a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin (A) having an acid value of 170 mgKOH/g or more on a solid basis;
the resin (A) being formed of a ((meth)acrylic acid)-based polymer in which a compound represented by formula (1):
wherein R1 represents H or Me; and R2 represents a linear or branched C2-C10 alkylene group, has been added to portions of carboxyl groups of (meth)acrylic acid composing the ((meth)acrylic acid)-based polymer,
a photopolymerization initiator (B); and
water (C).

### Claim 2 (depends on 1)

A method for forming a hydrogel according to claim 1, wherein the carboxyl groups of the ((meth)acrylic acid)-based polymer to which the compound represented by formula (1) has not been added are at least partially neutralized with an alkali.

### Claim 3

A hydrogel produced by subjecting a photosensitive resin composition to photopolymerization, the photosensitive resin composition comprising
a poly((meth)acrylic acid)-based water-soluble photo-sensitive resin (A) having an acid value of at least about 170 mgKOH/g on a solid basis;
the resin (A) being formed of a ((meth)acrylic acid)-based polymer in which a compound represented by formula (1):
wherein R1 represents H or Me; and R2 represents a linear or branched C2-C10 alkylene group, has been added to portions of carboxyl groups of (meth)acrylic acid composing the ((meth)acrylic acid)-based polymer,
a photopolymerization initiator (B); and
water (C).

### Claim 4 (depends on 3)

A hydrogel according to claim 3, wherein the carboxyl groups of the ((meth)acrylic acid)-based polymer to which the compound represented by formula (1) has not been added are at least partially neutralized with alkali.