# US 7,407,737 B2 · Method for the production of photoresist structures > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 7,407,737 B2 - Document ID: US7407737B2 - Status: Granted - Kind: B2 - Application number: 10/522,162 - Filed: 2003-07-18 - Published: 2006-07-13 - Granted: 2008-08-05 - Earliest claimed: 2002-07-22 - Assignees: Forschungszentrum Karlsruhe GmbH - Inventors: Daniel Meisel; Iouri Mikliaev; Martin Wegener - Web page: https://patentgrep.com/patent/US7407737B2 ## CPC - G03F 7/70216: {Mask projection systems} - B82Y 20/00: Nanooptics, e.g. quantum optics or photonic crystals - G02B 6/1225: {comprising photonic band-gap structures or photonic lattices} - G02B 2006/12107: {Grating} - G02B 2006/12173: {Masking} - G03H 2223/25: Index matching material - G03H 2250/12: Special arrangement of layers - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - B82Y: SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - G03H: HOLOGRAPHIC PROCESSES OR APPARATUS (holograms, e.g. point holograms, used as ordinary optical elements G02B5/32; producing stereoscopic or other three-dimensional effects G02B30/00; diffraction-grating systems G02B27/44; systems using moiré fringes G02B27/60; optical logic elements G02F3/00; stereo-photography G03B35/00; photosensitive materials or processes for photographic purposes G03C; {stereo-photographic or similar processes G03C9/00}; apparatus for processing exposed photographic materials G03D; analogue computers performing mathematical operations with the aid of optical elements G06E3/00; authentication by radiation, of concealed information carried by holograms or diffraction gratings G06K19/16; holographic storage G11B7/0065, G11C13/04; {stereoscopic or other three dimensional effects in television systems H04N13/00}) ## Abstract The invention relates to a method for producing a large variety of photoresist structures, wherein a volume of photosensitive material (5) is exposed at least once by means of at least two light beams (1, 2), which are superposed inside the photosensitive material (5), and is subsequently subjected to a developing process, wherein the light beams (1, 2) penetrate at least one transparent optical element (3). The optical element (3) is a polyhedron with planar or curved surfaces which largely prevents refraction of the light beams on the surface of the volume of photosensitive material (5) when the beams are fed-in and/or fed-out of the volume of photosensitive material (5), so that the angle of refraction for the light beams (1, 2) can be greater in the volume of photosensitive material (5) than the critical angle of the total reflection, which has a limiting effect without optical element (3). ## Claims ### Claim 1 A method for producing photoresist structures, comprising: exposing a volume of photosensitive material at least once with at least two light beams, each having an angle of incidence greater than a critical angle, which beams are superposed inside the photosensitive material, wherein the light beams penetrate at least one transparent optical element, and wherein the optical element comprises a polyhedron including at least one of planar or curved surfaces; and subjecting the photosensitive material to a developing process. ### Claim 2 (depends on 1) The method for producing photoresist structures according to claim 1, wherein the polyhedron comprises a partial prism including the planar surfaces. ### Claim 3 (depends on 2) The method for producing photoresist structures according to claim 2, wherein the partial prism comprises a pyramid. ### Claim 4 (depends on 2) The method for producing photoresist structures according to claim 2, wherein the partial prism comprises a truncated pyramid. ### Claim 5 (depends on 1) The method for producing photoresist structures according to claim 1, wherein the polyhedron comprises a spherical segment. ### Claim 6 (depends on 1) The method for producing photoresist structures according to claim 1, further including: prior to exposing, depositing the volume of photosensitive material directly onto the optical element. ### Claim 7 (depends on 1) The method for producing photoresist structures according to claim 1, further including: prior to exposing, depositing the volume of photosensitive material in-between two optical elements. ### Claim 8 (depends on 6) The method for producing photoresist structures according to claim 6, further including: prior to exposing, depositing an immersion substance between the optical element and the volume of photosensitive material. ### Claim 9 (depends on 1) The method for producing photoresist structures according to claim 1, further including: adjusting the light beams independently of each other with respect to at least one of intensity, phase or polarization. ### Claim 10 (depends on 1) The method for producing photoresist structures according to claim 1, wherein exposing includes: exposing the volume of photosensitive material at least twice, wherein between the exposures the light beams and the volume of photosensitive material are moved relative to each other. ### Claim 11 (depends on 1) The method for producing photoresist structures according to claim 1, further including: covering individual regions on a surface of the volume of photosensitive material with at least one shadow mask. ### Claim 12 (depends on 1) The method for producing photoresist structures according to claim 1, wherein exposing includes: additionally exposing the volume of photosensitive material with a single beam. ### Claim 13 (depends on 1) The method for producing photoresist structures according to claim 1, further including: dividing the volume of photosensitive material into segments. ### Claim 14 (depends on 1) The method for producing photoresist structures according to claim 1, further including: deposing the volume of photosensitive material on top of another volume of photosensitive material which is exposed with at least one beam. ### Claim 15 (depends on 1) A photoresist structure produced according to a method as defined in claim 1.