# US 7,407,635 B2 · Processes and apparatuses for treating halogen-containing gases

> Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt

- Number: US 7,407,635 B2
- Document ID: US7407635B2
- Status: Granted
- Kind: B2
- Application number: 10/738,686
- Filed: 2003-12-16
- Published: 2004-07-08
- Granted: 2008-08-05
- Earliest claimed: 2001-07-11
- Assignees: Battelle Memorial Institute
- Inventors: Gary B. Josephson; Delbert L. Lessor; Amit K. Sharma; Christopher Lyle Aardahl; Kenneth G. Rappe
- Web page: https://patentgrep.com/patent/US7407635B2

## CPC

- B01D 53/68: Halogens or halogen compounds
- B01D 53/70: Organic halogen compounds
- B01D 2259/818: Employing electrical discharges or the generation of a plasma
- B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28)

## Abstract

There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

## Claims

### Claim 1

A plasma reactor apparatus, comprising:
a chamber defining at least one first gas inlet for receiving a first gas, and at least one water inlet for receiving liquid water;
at least one first electrode disposed within the chamber and defining a first surface that is in fluid communication with the water inlet for receiving liquid water, and at least one second gas inlet for receiving a second gas;
an electrochemical cell that is in fluid communication with the second gas inlet; and
at least one second electrode disposed within the chamber and opposing the first surface of the first electrode;
wherein a dielectric barrier is disposed on at least one of the first surface of the first electrode or a surface of the second electrode.

### Claim 2 (depends on 1)

An apparatus according to claim 1, wherein the first electrode defines a plurality of second gas inlets.

### Claim 3 (depends on 1)

An apparatus according to claim 1, further comprising gas/liquid scrubbing packing material disposed within the chamber.

### Claim 4 (depends on 1)

An apparatus according to claim 1, wherein the first electrode defines a cylinder shape and is immersed in the liquid water.

### Claim 5 (depends on 1)

An apparatus according to claim 1, comprising a plurality of spaced-apart first electrodes and a plurality of second gas inlets defined by the spaces between the spaced-apart first electrodes.