Large field of view 2X magnification projection optical system for FPD manufacture

An exposure system for manufacturing flat panel displays (FPDs) comprising:

• a reticle stage adapted to hold a reticle;
• a substrate stage adapted to hold a substrate;
• a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising at least two powered mirrors;
• and
• a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image.

An exposure system for manufacturing flat panel displays (FPDs) comprising:

• a reticle stage adapted to hold a reticle;
• a substrate stage adapted to hold a substrate;
• a magnification reflective optical system that images the reticle onto the substrate, the reflective optical system comprising a plurality of powered mirrors that are non-symmetric relative to their center axes;
• and
• a reflective corrector near one of the reticle and the substrate, wherein the reflective corrector is configured to correct residual aberrations and telecentricity errors in the system to produce an image with a desired undistorted shape without forming an intermediate image.