Gas cluster-ion irradiation apparatus
AssigneeHitachi, Ltd.
InventorsShigeru Ono, Shinji Sasaki, Kenji Furusawa, Jiro Matsuo, Toshio Seki
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AssigneeHitachi, Ltd.
InventorsShigeru Ono, Shinji Sasaki, Kenji Furusawa, Jiro Matsuo, Toshio Seki
Estimating the term…
In a cluster ion beam irradiation apparatus including an apparatus for measuring size and energy distribution of gas cluster ions by using the time of flight (TOF) mass spectrometry, a unit for applying a retarding voltage is disposed in a stage preceding a TOF measuring instrument including a drift tube and a current measuring instrument. By measuring the size and energy distribution of the gas cluster ions and adjusting ionization conditions, cluster ions having predetermined energy and size are supplied to a work surface. In addition, a product of a pressure in an ion transportation device and an ion transportation length is controlled so as to satisfy the relation P×L≦30/N2/3/E1/2 Pa·m, where N is the size of gas cluster ions used for irradiation, and E is kinetic energy (eV) of the gas cluster ions.
A gas cluster ion irradiation apparatus, comprising:
A gas cluster ion irradiation apparatus comprising:
A gas cluster ion irradiation apparatus comprising:
Dependencies are inferred from the claim text.