Wiring substrate and method for manufacturing the same
AssigneeSharp Kabushiki Kaisha
InventorsHajime Imai, Osamu Sugimoto, Katsuhiro Okada, Isao Ogasawara
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Abstract
A wiring substrate of the present invention includes a short ring (SR) formed along a periphery of the substrate, an independent line pattern (e.g., a gate terminal) that is coplanar with and independent of SR, a continuous line pattern (e.g., a storage capacitor stem) that is located closest to the independent line pattern and is coplanar and continuous with SR, and an insulating film covering the independent line pattern and the continuous line pattern. The insulating film includes a first through hole reaching the independent line pattern and a second through hole reaching the continuous line pattern.
Claims12
A wiring substrate, comprising a short ring formed along a periphery of the substrate, an independent line pattern that is coplanar with and independent of the short ring, a first continuous line pattern that is coplanar and continuous with the short ring, a second continuous line pattern that is located between the independent line pattern and the first continuous line pattern and is coplanar and continuous with the short ring, and an insulating film covering the independent line pattern and the first and second continuous line patterns, wherein:
- the insulating film includes a first through hole reaching the independent line pattern, a second through hole reaching the first continuous line pattern, and a third through hole reaching the second continuous line pattern;
- the independent line pattern and the first continuous line pattern are electrically connected to each other by a connection pattern bridging the second continuous line pattern via the first through hole and the second through hole;
- and the third through hole is formed in an area other than an area where the connection pattern is formed.
A wiring substrate, comprising a short ring formed along a periphery of the substrate, an independent line pattern that is coplanar with and independent of the short ring, a first continuous line pattern that is coplanar and continuous with the short ring, a second continuous line pattern that is located between the independent line pattern and the first continuous line pattern and is coplanar and continuous with the short ring, and an insulating film covering the independent line pattern and the first and second continuous line patterns, wherein:
- the insulating film includes a first through hole reaching the independent line pattern and a second through hole reaching the first continuous line pattern;
- the independent line pattern and the first continuous line pattern are electrically connected to each other by a connection pattern bridging the second continuous line pattern via the first through hole and the second through hole;
- the second continuous line pattern includes a protruding portion that is located in an area other than an area where the connection pattern is formed and is protruding toward the independent line pattern while being coplanar with the short ring;
- and a distance between the first through hole and the second continuous line pattern in the area where the connection pattern is formed is longer than a distance between the first through hole and the protruding portion.
Dependencies are inferred from the claim text.