Pattern forming method and substance adherence pattern material
AssigneeFUJIFILM Corporation
InventorsKoichi Kawamura, Takeyoshi Kano
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Abstract
The present invention relates to a pattern forming method comprising image-wise forming, on a surface of a substrate, a region having an ability to initiate polymerization, forming a graft polymer on the region by atom transfer radical polymerization, and adhering a substance to the graft polymer. The method can be applied for preparing an image forming material, a fine particle adsorption pattern material, a conductive pattern material, or the like by selecting a suitable substance.
Claims13
A pattern forming method, comprising image-wise forming, on a surface of a substrate, a region where an initiator having an ability to initiate polymerization is image-wise fixed over the whole area of the substrate and then image-wise exposing to light to inactivate the polymerization-initiating ability of the initiator in the region exposed to light so that the initiator fixed on the region not exposed to light maintains its activity, forming a graft polymer on the region by atom transfer radical polymerization to form a hydrophilic/hydrophobic pattern which includes regions having a graft polymer formed and regions having no graft polymer formed, and applying a substance to the hydrophilic or hydrophobic region of the hydrophilic/hydrophobic pattern,
- wherein the atom transfer radical polymerization is conducted in the presence of a transition metal complex as a catalyst.
Dependencies are inferred from the claim text.