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US 7,405,031 B2Granted
Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorRalph Kurt
Life of this patent
Estimating the term…
Abstract
A multi-optical-layer optical element of a lithographic projection apparatus in which at least one optical layer is comprised of an alloy of Mo and Cr. That layer may form the outer most layer of a Mo/Si layer system with an optional protective outer coating of Ru. Furthermore, the multi-optical-layer optical element may be comprised of a plurality of interposed between Mo/Cr alloyed layers.
Claims16
A lithographic apparatus, comprising:
- a radiation system constructed and arranged to provide a projection beam of radiation;
- a support structure constructed and arranged to support a patterning device, the patterning device constructed and arranged to pattern the projection beam according to a desired pattern;
- a substrate table constructed and arranged to hold a substrate;
- a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate, wherein at least one optical element on which the beam of radiation is incident has at least one optical layer comprised of an alloy of Mo and Cr.
1 more element
A device manufacturing method, comprising:
- projecting a patterned beam of radiation onto a target portion of the layer of radiation-sensitive material at least partially covering a substrate, wherein at least one optical element on which the beam of radiation is incident having at least one optical layer comprised of an alloy of Mo and Cr.
Dependencies are inferred from the claim text.