US 7,404,862 B2Granted

Device and method for organic vapor jet deposition

AssigneeThe Trustees of Princeton University

InventorsMax Shtein, Stephen R. Forrest, Jay B. Benzinger

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Abstract

A device and a method for facilitating the deposition and patterning of organic materials onto substrates utilizing the vapor transport mechanisms of organic vapor phase deposition is provided. The device includes one or more nozzles, and an apparatus integrally connected to the one or more nozzles, wherein the apparatus includes one or more source cells, a carrier gas inlet, a carrier gas outlet, and a first valve capable of controlling the flow of a carrier gas through the one or more source cells. The method includes moving a substrate relative to an apparatus, and controlling the composition of the organic material and/or the rate of the organic material ejected by the one or more nozzles while moving the substrate relative to the apparatus, such that a patterned organic layer is deposited over the substrate.

Claims15

Dependent claims

A device, comprising:

one or more nozzles;
and
an apparatus integrally connected to the one or more nozzles, the apparatus comprising:
a plurality of source cells, each source cell containing an organic material;
a carrier gas inlet leading to each source cell;
a carrier gas outlet leading from each source cell to the one or more nozzles;
and
a first valve capable of controlling the flow of a carrier gas through the plurality of source cells;
wherein:
each of the plurality of source cells includes a first cylindrical portion having a first radius;
each of the plurality of source cells is contained in a cylindrical source bore in the apparatus having a second radius slightly larger than the first radius;
and
the first valve comprises an aperture in at least one of the plurality of source cells that aligns with the carrier gas inlet when the at least one of the plurality of source cells is in a first position, and does not align with the carrier gas inlet when the at least one of the plurality of source cells is in a second position.

10 more elements

Dependencies are inferred from the claim text.

Facts

Application: 10/422,269Filed 23 Apr 2003 · continuation in part
Priority: 4 Sep 2001
Published: US 2004/0048000 A111 Mar 2004
Granted: 29 Jul 2008
Term ends: Not estimatedThe source records don’t support an estimate.

Classification12 codes

C23C 14/04
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material: coating on selected surface areas, e.g. using…
C23C 14/042
Coating on selected surface areas, e.g. using masks: using masks
C23C 14/12
Characterised by the coating material: organic material
C23C 14/228
Characterised by the process of coating: gas flow assisted PVD deposition

Family

Application60/317,215Us provisional application · filed 4 Sep 2001
Application60/316,264Us provisional application · filed 4 Sep 2001
Application60/316,968Us provisional application · filed 5 Sep 2001
Application60/332,090Us provisional application · filed 21 Nov 2001
Application10/233,470Parent of this continuation-in-part · filed 4 Sep 2002
US 2004/0048000 A1Pre-grant publication · published 11 Mar 2004
US 2008/0233287 A1Published application
US 7,431,968 B1Related patent
US 7,404,862 B2This patent

From the US filing history. Foreign family members aren’t listed.