Top coat composition
AssigneeCentral Glass Company, Limited
InventorsKazuhiko Maeda, Haruhiko Komoriya, Shinichi Sumida, Satoru Miyazawa, Michitaka Ootani
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Abstract
The present invention relates to a top coat composition, which is characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3]. It is possible to produce a top coat composition solution by dissolving this top coat composition in an organic solvent. These top coat composition and top coat composition solution can be used in immersion lithography.
Claims11
A top coat composition characterized in that it is applied to a photoresist top surface by using a polymer containing at least one structure represented by the formula [1], [2] or [3],
- in the formulas, R1 represents a hydrogen, fluorine, cyano group, methyl group or trifluoromethyl group;
- R2 represents O, (C═O)O, CH2O, or a single bond;
- R3 represents a cyclohexyl ring, of which hydrogens may partially be replaced with CH or hydroxyl group or halogen;
- R4 represents a trifluoromethyl group;
- R5 represents a hydrogen or protective group optionally containing fluorine;
- n represents 1 or 2;
- m represents 1;
- and R6 represents an alicyclic group.
Dependencies are inferred from the claim text.