Cylinder-type capacitor and storage device, and method(s) for fabricating the same
AssigneeDongbu Electronics Co., Ltd.
InventorJae Hyun Kang
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Abstract
A one cylinder storage device and a method for fabricating a capacitor are disclosed, realizing simplified fabrication by overexposure with a mask having a plurality of holes, in which the method includes forming a contact hole in an insulating layer on a semiconductor substrate; forming a conductive layer on the insulating layer to fill the contact hole; forming a photoresist layer on the conductive layer; forming a photoresist layer pattern by overexposure and generating a side lobe phenomenon; forming a cylindrical lower electrode by patterning the conductive layer using the photoresist layer pattern as a mask; and forming a dielectric layer and an upper electrode covering the lower electrode.
Claims21
A method for fabricating a cylinder-type storage device, the method comprising:
- forming a first conductive layer above a semiconductor substrate;
- forming a photoresist layer upon the first conductive layer;
- overexposing the photoresist layer to radiation passed through a phase shift mask, having partially transmissive areas and transparent areas, to create a virtual image on the semiconductor substrate from a peak and to produce a pattern in the photoresist layer having at least one substantially cylindrically-shaped structure corresponding to a boundary between the partially transmissive areas and the transparent areas;
- and
- etching portions of the conductive layer not covered by the cylindrically-shaped structure to form a lower electrode of the cylinder-type storage device.
Dependencies are inferred from the claim text.