Slurry compositions, methods of preparing slurry compositions, and methods of polishing an object using slurry compositions
AssigneeSamsung Electronics Co., Ltd.
InventorsJae-Hyun So, Sung-Taek Moon, Dong-Jun Lee, Nam-Soo Kim, Bong-Su Ahn, Kyoung-Moon Kang
Life of this patent
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Abstract
A slurry composition includes an acidic aqueous solution and one or both of, an amphoteric surfactant and a glycol compound. Examples of the amphoteric surfactant include a betaine compound and an amino acid compound, and examples of the amino acid compound include lysine, proline and arginine. Examples of the glycol compound include diethylene glycol, ethylene glycol and polyethylene glycol.
Claims23
A slurry composition comprising an acidic aqueous solution, an amphoteric surfactant, and a glycol compound selected from the group consisting of diethylene glycol, ethylene glycol and polyethylene glycol, a molecular weight of the polyethylene glycol being substantially equal to or less than about 100,000,
- wherein the acidic aqueous solution includes a peroxide compound,
- wherein the glycol compound acts in the slurry composition to reduce decomposition of the peroxide compound to maintain a constant concentration of the peroxide compound in the slurry composition, and
- wherein the amphoteric surfactant includes at least one selected from the group consisting of lysine, proline and arginine which functions as a corrosion inhibitor for a tungsten layer to which the slurry composition is applied.
A slurry composition comprising a peroxide compound, an acid, an abrasive, a carboxylic acid, an amphoteric surfactant, a glycol compound and pure water, wherein the glycol compound is selected from the group consisting of diethylene glycol, ethylene glycol and polyethylene glycol, a molecular weight of the polyethylene glycol being substantially equal to or less than about 100,000,
- wherein the glycol compound acts in the slurry composition to reduce decomposition of the peroxide compound to maintain a constant concentration of the peroxide compound in the slurry composition, and
- wherein the amphoteric surfactant includes at least one selected from the group consisting of lysine, proline and arginine which functions as a corrosion inhibitor for a tungsten layer to which the slurry composition is applied.
A slurry composition consisting essentially of a peroxide compound, an acid, an abrasive, a carboxylic acid, an amphoteric surfactant, a glycol compound, a pH-controlling agent and pure water, wherein the glycol compound is selected from the group consisting of diethylene glycol, ethylene glycol and polyethylene glycol, a molecular weight of the polyethylene glycol being substantially equal to or less than about 100,000,
- wherein the glycol compound acts in the slurry composition to reduce decomposition of the peroxide compound so that the slurry composition has a constant concentration of the peroxide compound, and wherein the amphoteric surfactant includes at least one selected from the group consisting of lysine, proline and arginine to be employed as a corrosion inhibitor for a tungsten layer to which the slurry composition is applied.
A slurry composition comprising an acidic aqueous solution, an amphoteric surfactant and a glycol compound selected from the group consisting of diethylene glycol, ethylene glycol and polyethylene glycol, a molecular weight of the polyethylene glycol being substantially equal to or less than about 100,000,
- wherein the acidic aqueous solution includes a peroxide compound, and the glycol compound acts in the slurry composition to reduce decomposition of the peroxide compound to maintain a constant concentration of the peroxide compound in the slurry composition,
- wherein the amphoteric surfactant includes at least one selected from the group consisting of lysine, proline and arginine which functions as a corrosion inhibitor for a tungsten layer to which the slurry composition is applied, and
- wherein the slurry composition has a pH of about 2 to about 4 to be applied to the tungsten layer.
Dependencies are inferred from the claim text.