Apparatus and method for cleaning a glass substrate before photoresist coating
AssigneeAu Optronics Corporation
InventorsWei-Ting Chen, Man-Hung Wu, Hung-Yi Cheng
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Abstract
A method for cleaning a glass substrate before photoresist coating, which method can remove oxide compounds and organic residues from the surface of a metal layer of the glass substrate, comprises the steps of firstly providing an alkaline developer in a concentration of between 0.35% and 0.45%; later immersing the metal film of the glass substrate in the alkaline developer; then rinsing the metal film of the glass substrate after immersed with clean water; and lastly having the surface of the metal film of the glass substrate in a dry treatment.
Claims11
A method for cleaning a glass substrate for removing oxide compounds and organic residues before a photoresist coating, wherein a metal film is formed on the surface of said glass substrate, said method comprising the steps of:
- providing an alkaline developer;
- immersing said metal film in said alkaline developer for a time between 30 seconds and 50 seconds;
- rinsing said metal film to remove the oxide compounds and organic residues from a surface of the metal film before the glass substrate is coated with a photoresist after immersed with clean water;
- and
- drying the surface of said metal film.
A method for cleaning a glass substrate before photoresist coating, comprising the step of immersing the glass substrate in an alkaline developer to remove oxide compounds and organic residues on a surface of a metal layer of the glass substrate before the glass substrate is coated with a photoresist.
Dependencies are inferred from the claim text.