Halogenated oxime derivatives and the use thereof
AssigneeCiba Specialty Chemicals Corporation
InventorsHitoshi Yamato, Toshikage Asakura, Akira Matsumoto, Peter Murer, Tobias Hintermann
Life of this patent
Estimating the term…
Loading patent…
AssigneeCiba Specialty Chemicals Corporation
InventorsHitoshi Yamato, Toshikage Asakura, Akira Matsumoto, Peter Murer, Tobias Hintermann
Estimating the term…
Compounds of the formula (I) or (II) wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2- C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10 haloalkyl; Arl is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar′1 is for example phenylene, naphthylene, diphonylene, heteroarylene, oxydiphenylene, phenyleneD-D1-D-phenylene or —Ar′1-A1—Y1-A1—Ar′1—; wherein these radicals optionally are substituted; Ae′, is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A, is for example a direct bond, —0—, —S—, or —NR6—; Y, inter alia is C1-C18alkylene; X is halogen; D is for example —0—, —S— or —NR6—; D, inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
A compound of the formula I
Dependencies are inferred from the claim text.