Liquid crystal display device and method of fabrication thereof having dummy layer and plurality of contact holes formed through ohmic contact, semiconductive and gate insulating layers

An LCD device, comprising:

• a data line, first dummy layer, second dummy layer, and source and drain electrodes formed on a substrate;
• an ohmic contact layer formed on the data line, the first dummy layer, the second dummy layer, and the source and drain electrodes;
• a semiconductor layer and a gate insulating layer formed on the substrate;
• a plurality of contact holes formed through the ohmic contact layer, semiconductor layer, and the gate insulating layer, wherein at least one contact hole exposes the drain electrode;
• a gate line formed on the gate insulating layer perpendicular to the data line;
• a gate electrode formed extending from the gate line, wherein the gate electrode is positioned between the source electrode and the drain electrode;
• pixel regions defined by intersections of the gate lines and the date lines;
• a pixel electrode formed of a same material as the gate line in the pixel region, the pixel electrode being electrically connected with the drain electrode through another contact hole, wherein the pixel electrode has a first portion and a plurality of second portions;
• a common line formed of the same material as the gate line;
• a common electrode formed of the same material as the gate line in the pixel region, wherein the common electrode has a plurality of second portions such that one second portion of the common electrode is positioned next to one second portion of the pixel electrode.

A method for fabricating an LCD device comprising:

• forming a data line, a dummy layer, and source and drain electrodes on a substrate;
• forming an ohmic contact layer on the data line, the dummy layer, and the source and drain electrode;
• sequentially depositing a semiconductor layer and a gate insulating layer on an entire surface of the substrate including the source and drain electrodes, dummy layer, and the data line;
• forming a plurality of contact holes through the ohmic contact layer, the semiconductor layer, and the gate insulating layer, wherein a first contact hole exposes the drain electrode and at least one second contact hole exposes the dummy layer;
• forming a gate line on the gate insulating layer perpendicular to the data line, wherein a gate electrode is formed extending from the gate line and the gate line is electrically connected with the dummy layer through the at least one second contact hole;
• and
• forming a pixel electrode which connects with the drain electrode through the first contact hole, wherein the pixel electrode is formed of a same material as the gate line.

A method for fabricating an LCD device comprising:

• forming source and drain electrodes, a data line, and first and second dummy layers on a substrate;
• forming an ohmic contact layer on the data line, the source and drain electrodes, and the first and second dummy layers;
• sequentially forming a semiconductor layer and a gate insulating layer on an entire surface of the substrate including the source and drain electrodes, the data line and the first and second dummy layers;
• forming a plurality of contact holes through the ohmic contact layer, the semiconductor layer, and the gate insulating layer, wherein first contact hole exposing the drain electrode, and at least one second contact hole exposing the first dummy layer and another second hole exposes the second dummy layer;
• forming a gate line on the gate insulating layer perpendicular to the data line, wherein a gate electrode is formed extending from the gate line and the gate line is electrically connected with the first dummy layer through the at least one second contact hole;
• forming a pixel electrode having a first portion and a plurality of second portions, the pixel electrode connected with the drain electrode through the first contact hole, and the pixel electrode is formed of a same material as the gate line;
• forming a common electrode having a plurality of second portions, the common electrode formed of the same material as the gate line, wherein one second portion of the common electrode is positioned next to one second portion of the pixel electrodes;
• and
• forming a common line which is electrically connected with the second dummy layer through another second contact hole to apply a common voltage to the common electrode.