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US 7,397,109 B2Granted
Method for integration of three bipolar transistors in a semiconductor body, multilayer component, and semiconductor arrangement
AssigneeATMEL Germany GmbH
InventorChristoph Bromberger
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Abstract
A method for integrating three bipolar transistors into a semiconductor body, multilayer component, and semiconductor arrangement is provided. A tendency toward thyristor-like behavior of the multilayer semiconductor arrangements with the three bipolar transistors is suppressed with the aid of a heterojunction. The high frequency characteristics and the blocking capability of the circuit of the three bipolar transistors is made more flexible, while the capability of an input signal to control an output signal is maintained.
Claims6
A multilayer component comprising:
- first semiconductor layers of a second conductivity type;
- and
- second semiconductor layers of a first conductivity type, which form at least three transistors,
- wherein the first semiconductor layers of the second conductivity type form the bases of the transistors,
- wherein the second semiconductor layers of the first conductivity type form an intermediate base layer in addition to at least one collector and at least one emitter,
- wherein the intermediate base layer borders on the first semiconductor layers of the second conductivity type, the intermediate base layer having a first semiconductor material,
- wherein at least one semiconductor layer of the second conductivity type has a second semiconductor material, and
- wherein a value of an energy gap in the second semiconductor material is smaller less than a value of an energy gap in the first semiconductor material by at least an amount that is equal to a value of a mean thermal energy of charge carriers.
5 more elements
A multilayer component comprising:
- first semiconductor layers of a second conductivity type;
- and
- second semiconductor layers of a first conductivity type, which form at least three transistors,
- wherein the first semiconductor layers of the second conductivity type form the bases of the transistors,
- wherein the second semiconductor layers of the first conductivity type form an intermediate base layer in addition to at least one collector and at least one emitter,
- wherein the intermediate base layer borders on the first semiconductor layers of the second conductivity type, the intermediate base layer having a first semiconductor material,
- wherein at least one semiconductor layer of the second conductivity type has a second semiconductor material,
- wherein a difference between a value of an energy gap in the second semiconductor material and a value of an energy gap in the first semiconductor material is equal to at least a value of a mean thermal energy of charge carriers.
5 more elements
Dependencies are inferred from the claim text.