Lithographic apparatus, contaminant trap, and device manufacturing method

An apparatus comprising:

• a radiation system including a source configured to produce a radiation beam;
• and
• a contaminant trap arranged in a path of the radiation beam, the contaminant trap comprising a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam,
• wherein the foils or plates are oriented substantially radially with respect to an optical axis of the radiation beam, and
• wherein the contaminant trap is provided with a gas supply system arranged to at least partially extend into or across at least one of the channels and configured to directly inject gas at least at two different positions into each of the channels of the contaminant trap.

A lithographic apparatus comprising:

• a radiation system including a source configured to produce a radiation beam;
• and
• a contaminant trap arranged in a path of the radiation beam, the contaminant trap comprising a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam,
• wherein the contaminant trap is provided with a gas supply system which is configured to inject gas directly into each of the channels of the contaminant trap,
• wherein the gas supply system is configured to achieve:
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• wherein p(x) is the pressure at location x in the channel, x1 is the position of the entrance of the channel and x2 is the position of the gas outflow opening(s) in the channel.

A contaminant trap, configured to be arranged in a path of a radiation beam during use, the contaminant trap comprising a plurality of foils or plates defining radiation transmission channels which substantially transmit the radiation beam during use,

• wherein the contaminant trap is provided with a gas supply system which is arranged to inject gas directly at least at two different locations into at least one of the channels of the contaminant trap,
• wherein the gas supply system is configured to achieve:
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• in each of the channels,
• wherein p(x) is the pressure at location x in the channel, x1 is the position of the entrance of the channel and x2 is the position of the gas outflow opening(s) in the channel.

A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate, wherein:

• a source is provided to produce a radiation beam;
• and
• a contaminant trap is provided in a path of the radiation beam,
• wherein the contaminant trap comprises a plurality of foils or plates defining radiation transmission channels which substantially transmit said radiation beam,
• wherein gas is directly injected at least at two different positions into at least one of the channels of the contaminant trap via a gas injector arranged to at least partially extend into or across the at least one of the channels.

A device manufacturing method comprising projecting a patterned beam of radiation onto a substrate, wherein:

• a source is provided to produce a radiation beam;
• and
• a contaminant trap is provided in a path of the radiation beam,
• wherein the contaminant trap comprises a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam, and
• wherein gas is directly injected at least at two different positions into each of the channels of the contaminant trap via a gas injector arranged to at least partially extend into or across each of the channels.