Technique for tuning an ion implanter system
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorsShengwu Chang, Joseph C. Olson, Damian Brennan
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Abstract
A technique for tuning an ion implanter system is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for tuning an ion implanter system having multiple beam-line elements. The method may comprise establishing one or more relationships among the multiple beam-line elements. The method may also comprise adjusting the multiple beam-line elements in a coordinated manner, based at least in part on the one or more established relationships, to produce a desired beam output.
Claims25
A method for tuning an ion implanter system having multiple beam-line elements, the method comprising:
- generating, from a beam setup database, a tuning table having a plurality of entries, wherein each entry comprises a combination of settings for the multiple beam-line elements that are likely to produce a desired beam output;
- adjusting the multiple beam-line element settings in a coordinated manner by applying one or more of the plurality of entries to the multiple beam-line elements until an actual beam output within an acceptable range of the desired beam output is achieved;
- and
- upon exhausting the plurality of the entries in the tuning table without bringing the actual beam output within the acceptable range of the desired beam output, further adjusting the multiple beam-line elements in a coordinated manner to search for a new combination of settings that produces the desired beam output, thereby accumulating an additional entry for the tuning table.
A system for tuning an ion implanter system having multiple beam-line elements, the system comprising:
- means for generating, from a beam setup database, a tuning table having a plurality of entries, wherein each entry comprises a combination of settings for the multiple beam-line elements that are likely to produce a desired beam output;
- means for adjusting the multiple beam-line element settings in a coordinated manner by applying one or more of the plurality of entries to the multiple beam-line elements until an actual beam output within an acceptable range of the desired beam output is achieved;
- and
- means for further adjusting the multiple beam-line elements in a coordinated manner to search for a new combination of settings that produces the desired beam output and adding the new combination of settings to the beam setup database in association with the desired beam output, thereby accumulating an additional entry for the tuning table.
A system for tuning an ion implanter system having multiple beam-line elements, the system comprising:
- a processor, a storage device, a beam tuning controller, and a measurement interface, wherein
- the storage device stores a beam setup database that establishes one or more relationships among the multiple beam-line elements,
- the processor generates, from the beam setup database, a tuning table having a plurality of entries, wherein each entry comprises a combination of settings for the multiple beam-line elements that are likely to produce a desired beam output,
- the processor causes the beam tuning controller to adjust the multiple beam-line element settings in a coordinated manner by causing the beam tuning controller to apply one or more of the plurality of entries to the multiple beam-line elements until an actual beam output within an acceptable range of the desired beam output is detected by the measurement interface, and
- upon exhausting the plurality of entries in the tuning table without brining the actual beam output within the acceptable range of the desired beam output, the processor further causes the beam tuning controller to adjust the multiple beam-line elements in a coordinated manner to search for a new combination of settings that produces the desired beam output, and adding the new combination of settings to the beam setup database in association with the desired beam output, thereby accumulating an additional entry for the tuning table.
Dependencies are inferred from the claim text.