Chemical amplification type resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsAiri Yamada, Yasunori Uetani, Akira Kamabuchi
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Abstract
The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and (B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
Claims3
A polymeric compound comprising a structural unit of the formula (Ib)
- wherein Q11 and Q12 each independently represent alkyl having 1 to 6 carbon atoms or cycloalkyl having 3 to 10 carbon atoms, or Q11 and Q12 bond to form divalent acyclic hydrocarbon having 3 to 7 carbon atoms which form a ring together with the adjacent S+;
- Q8, Q13, Q16 and Q17 each independently represent hydrogen or methyl;
- n11 denotes 0 or natural number;
- and Q15 represents perfluoroalkyl having 1 to 8 carbon atoms, alkyl having 1 to 8 carbon atoms or aromatic group having 6 to 12 carbon atoms which may be substituted, or camphor group.
Dependencies are inferred from the claim text.