Method of fabricating a liquid crystal display device

A method of fabricating a liquid crystal display device, comprising:

• forming first and second conductive layers on a substrate;
• forming a photo-resist pattern on the second conductive layer;
• patterning the second conductive layer and the first conductive layer using the photo-resist pattern as a mask, wherein an edge of the patterned first conductive layer is located inside an edge of the patterned second conductive layer;
• ashing the photo-resist pattern so as to reduce the photo-resist pattern remaining on the second conductive layer after patterning the second conductive layer and the first conductive layer;
• etching at least one lateral part of the patterned second conductive layer using the ashed photo-resist pattern as a mask;
• and
• removing the remaining photo-resist pattern,
• wherein patterning the second conductive layer and the first conductive layer includes;
• etching the second conductive layer using a first wet etching process;
• and
• etching the first conductive layer using a second wet etching process.