Etching method for metal layer of display panel
AssigneeAu Optronics Corporation
InventorsShiun-Chang Jan, Yi Lu, Yi-Ming Shan, Yi-Chun Chen
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Abstract
An etching process of a metal layer of a display panel is provided. First, a substrate with at least one display panel region, a testing device region, and a non-device region is provided. Then, a metal layer is formed over the substrate to cover the display panel region, the testing device region, and the non-device region. Next, a mask is formed on the metal layer to expose a portion of the metal layer. The area of the metal layer exposed by the mask substantially occupies 70%˜88% of the total area of the metal layer. Thereafter, a wet etching process is performed to remove the metal layer exposed by the mask.
Claims12
A method for etching a metal layer of a display panel, the method comprising:
- providing a substrate, wherein the substrate comprises at least one display panel region, a testing device region, and a non-device region;
- forming a metal layer over the substrate to cover the display panel region, the testing device region, and the non-device region;
- forming a mask on the metal layer to expose a portion of the metal layer, wherein the area of the metal layer exposed by the mask substantially occupies 70%˜88% of the total area of the metal layer;
- and
- performing a wet etching process to remove the metal layer exposed by the mask.
Dependencies are inferred from the claim text.