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US 7,396,637 B2Granted
Method for manufacturing electroluminescent element
AssigneeDai Nippon Printing Co., Ltd.
InventorsNorihito Itou, Tomoyuki Tachikawa
Life of this patent
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Abstract
A main object of the present invention is to provide a method for manufacturing an EL element which can avoid a state which plural unnecessary layers are laminated on each pattern-formed light-emitting portion when the light-emitting portions are formed by photolithography and thus enables quick and easy peeling treatment in the peeling process of the unnecessary layers.
Claims12
A method for manufacturing an electroluminescent element by photolithography, comprising:
- a process of forming a buffer layer, a light-emitting portion of at least one color, and a photoresist layer on a substrate in this order starting from the substrate side;
- a process of forming the buffer layer by coating a buffer layer forming coating solution;
- a process of forming a heterochromatic light-emitting layer by coating the buffer layer with a heterochromatic light-emitting layer forming coating solution which expresses a different color from the color of the above light-emitting portion;
- a process of forming a photoresist layer for the heterochromatic light-emitting layer by coating the heterochromatic light-emitting layer with a photoresist;
- a process of pattern-exposing and developing the photoresist layer for the heterochromatic light-emitting layer, such that only a portion of the photoresist layer for the heterochromatic light-emitting layer which the heterochromatic light-emitting portion is to be formed, is remained;
- and
- a process of forming the heterochromatic light-emitting portion, having the photoresist layer for the heterochromatic light-emitting layer on the surface thereof, in a pattern by removing portions of the buffer layer and the heterochromatic light-emitting layer which the photoresist layer for the heterochromatic light-emitting layer is removed, wherein the photoresist layer for the heterochromatic light-emitting layer is insoluble to a buffer layer solvent of the buffer layer forming coating solution.
4 more elements
A method for manufacturing an electroluminescent element by photolithography, comprising:
- a process of forming a buffer layer, a first light-emitting portion and a first photoresist layer on a substrate in this order from the substrate side;
- a process of forming the buffer layer by coating a buffer layer forming coating solution;
- a process of forming a second light-emitting layer by coating the buffer layer with a second light-emitting layer forming coating solution;
- a process of forming a second photoresist layer by coating the second light-emitting layer with a photoresist;
- a process of pattern-exposing and then developing the second photoresist layer, such that only a portion of the second photoresist layer which the second light-emitting portion is to be formed, is remained;
- a process of forming the second light-emitting portion, having the second photoresist layer on the surface thereof, in a pattern by removing portions of the buffer layer and the second light-emitting layer which the second photoresist layer is removed;
- a process of providing the first light-emitting portion having the first photoresist layer on a surface thereof, and the second light-emitting portion having the second photoresist layer on a surface thereof, on the substrate;
- a process of forming the buffer layer by coating the substrate with the buffer layer forming coating solution, and then forming a third light-emitting layer by coating the buffer layer with a third light-emitting layer forming coating solution;
- a process of forming a third photoresist layer by coating the third light-emitting layer with a photoresist;
- a process of pattern-exposing and then developing the third photoresist layer, such that only a portion of the third photoresist layer which the third light-emitting portion is to be formed, is remained;
- a process of forming the third light-emitting portion, having the third photoresist layer on a surface thereof, in a pattern by removing portions of the buffer layer and the third light-emitting layer which the third photoresist layer is removed,
- wherein each of the photoresist layers is insoluble to a buffer layer solvent of the buffer layer forming coating solution.
9 more elements
Dependencies are inferred from the claim text.