Segmented resist islands for photolithography on single sliders
AssigneeHitachi Global Storage Technologies Netherlands B.V.
InventorsCherngye Hwang, Kim Y. Lee, Dennis R. McKean, Gary Suzuki
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Abstract
A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.
Claims20
A method for creating segmented resist islands for photolithography on a plurality of single sliders, comprising:
- ramping the temperature of said plurality of single sliders to a temperature that is below proper softbake temperature, wherein said plurality of single sliders resides in a divider and wherein said plurality of single sliders and walls of said divider have a layer of resist deposited thereon;
- performing coarse lithography to remove said resist above portions of said walls of said divider;
- and
- continuing ramping of temperature of said plurality of single sliders, said resist and said divider to said proper softbake temperature.
A method for reducing stresses during the lithographic process for forming a plurality of single sliders, comprising:
- ramping the temperature of said plurality of single sliders, to a temperature that is below proper softbake temperature, wherein said plurality of single sliders resides in a divider and wherein said plurality of single sliders and walls of said divider have a layer of resist deposited thereon;
- performing coarse lithography to remove said resist above portions of said walls of said divider;
- and
- continuing ramping of temperature of said plurality of single sliders, said resist and said divider to said proper softbake temperature.
A method for forming a plurality of single sliders using a slider divider, comprising:
- ramping the temperature of said plurality of single sliders, to a temperature that is below proper softbake temperature, wherein said plurality of single sliders resides in a
- divider and wherein said plurality of single sliders and walls of said divider have a layer of resist deposited thereon;
- performing coarse lithography to remove said resist above portions of said walls of said divider;
- continuing ramping of temperature of said plurality of single sliders, said resist and said divider to said proper softbake temperature and baking;
- performing critical lithography to expose an air bearing surface pattern on each of said plurality of single sliders;
- and
- developing said pattern.
Dependencies are inferred from the claim text.