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US 7,395,823 B2Granted
Method and apparatus for local fluorine and nitrogen trifluoride production
AssigneeThe BOC Group, Inc.
InventorDonald P. Satchell, Jr.
Life of this patent
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Abstract
The present invention relates to a process for production, shipment, and treatment of a NH4F(HF)x feedstock for local production of fluorine and NF3 for semiconductor chamber cleaning without the need for storage of large quantities of dangerous feeds and intermediate products.
Claims17
A method for producing F2 and NF3 cleaning gases for semiconductor chambers, said method comprising:
- producing an NH4F(HF)x solution;
- providing said NH4F(HF)x solution to an HF production unit;
- heating said NH4F(HF)x solution in said HF production unit to produce an NH4F(HF)x feed stream and an HF feed stream;
- providing said HF feed stream to an F2 production unit to produce a crude F2 stream;
- providing said crude F2 stream to an F2 purification unit to produce a purified F2 product stream;
- providing said NH4F(HF)x feed stream and a portion of said crude or said purified F2 stream to an NF3 production unit to produce a crude NF3 stream;
- and
- providing said crude NF3 stream to an NF3 purification unit to produce a purified NF3 product stream.
5 more elements
Dependencies are inferred from the claim text.