Plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsNobuo Ishii, Kibatsu Shinohara, Yasuyoshi Yasaka
Life of this patent
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Abstract
A first conductive plate (31A) constituting the radiation surface of a slot antenna (30A) inclines with respect to a first dielectric member (13) opposed to the radiation surface of the slot antenna (30A). Consequently, a plasma generated by the electric field of an electromagnetic field entering directly from the slot antenna (30A) can be set dominant over a plasma generated by the electric field of a standing wave formed in a processing vessel (11). Since the former can be controlled more easily than the latter, the plasma distribution can be improved.
Claims17
A plasma processing apparatus comprising a susceptor having a surface for placing a target object, wherein said surface of the susceptor is planar,
- a processing vessel in which said susceptor is arranged,
- a slot antenna opposed to said susceptor to supply an electromagnetic field into said processing vessel, and
- a first dielectric member opposed to a radiation surface of said slot antenna, wherein said first dielectric member is parallel with said surface of the susceptor,
- characterized in that said slot antenna comprises
- a first conductive plate constituting said radiation surface, wherein said first conductive plate is nonparallel with said surface of the susceptor,
- a second conductive plate arranged on a side opposite to said susceptor when seen from said first conductive plate, wherein said second conductive plate is parallel with said surface of the susceptor,
- an inlet port formed at a central part of said second conductive plate for introducing said electromagnetic field into a space between said first conductive plate and second conductive plate, and
- a plurality of slots formed in said first conductive plate so that said electromagnetic field introduced from said inlet port propagates from a central part of said space to a peripheral part and leaks out gradually in said processing vessel.
A plasma processing apparatus comprising a susceptor for placing a target object,
- a processing vessel in which said susceptor is arranged,
- a slot antenna opposed to said susceptor to supply an electromagnetic field into said processing vessel, and
- a first dielectric member opposed to a radiation surface of said slot antenna, wherein said first dielectric member is parallel with a surface of the susceptor,
- characterized in that said slot antenna comprises
- a first conductive plate constituting said radiation surface, wherein said first conductive plate is nonparallel with said surface of the susceptor,
- a second conductive plate arranged on a side opposite to said susceptor when seen from said first conductive plate, wherein said first and second conductive plates are nonparallel relative to one another, and said second conductive plate is parallel with said surface of the susceptor
- an inlet port formed at a central part of said second conductive plate for introducing said electromagnetic field into a space between said first conductive plate and second conductive plate, and
- a plurality of slots formed in said first conductive plate.
Dependencies are inferred from the claim text.