Optimized x-ray energy for high resolution imaging of integrated circuits structures
AssigneeXradia, Inc.
InventorsYuxin Wang, Wenbing Yun, Frederick William Duewer
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Abstract
An x-ray imaging system uses particular emission lines that are optimized for imaging specific metallic structures in a semiconductor integrated circuit structures and optimized for the use with specific optical elements and scintillator materials. Such a system is distinguished from currently-existing x-ray imaging systems that primarily use the integral of all emission lines and the broad Bremstralung radiation. The disclosed system provides favorable imaging characteristics such as ability to enhance the contrast of certain materials in a sample, to use different contrast mechanisms in a single imaging system, and to increase the throughput of the system.
Claims9
An imaging method for an x-ray imaging system, comprising:
- generating x-rays of a 8.4 keV Lα-line from a tungsten x-ray source;
- directing the x-rays at integrated circuits with copper structures on a silicon substrate;
- and
- forming an image of the copper structures on a detector using the x-rays.
An imaging method for an x-ray imaging system, comprising:
- generating x-rays of a 8.4 keV Lα-line from a tungsten x-ray source;
- directing the x-rays at integrated circuits with copper structures and a dielectric substrate;
- and
- forming an image of the copper structures on a detector using the x-rays in phase or absorption contrast.
Dependencies are inferred from the claim text.