Apparatus for generating a plurality of beamlets
AssigneeMapper Lithography IP B.V.
InventorPieter Kruit
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Abstract
The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means. In this way, it is possible to reduce aberrations of the converging means.
Claims32
A charged particle beam lithography system comprising an apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source for generating a diverging charged particle beam;
- a collimating means for collimating said diverging charged particle beam;
- said collimating means comprising at least one deflector array, and
- said deflector array being applied with a voltage to each deflector of said deflector array for deflecting a separate beamlet, wherein
- at least one deflector being adapted to assert a deflecting effect proportional to its distance with respect the optical axis of the beam.
An apparatus for generating a plurality of charged particle beamlets, comprising:
- a charged particle source for generating a diverging charged particle beam;
- a collimating means for collimating said diverging charged particle beam;
- said collimating means comprising at least one deflector array, and
- said deflector array being applied with voltages to each deflector of said deflector array for deflecting a beamlet, with
- the voltages being set to have each deflector assert a deflecting effect proportional to the distance of a deflector with respect the optical axis of the beam.
Dependencies are inferred from the claim text.