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US 7,389,023 B2Granted
Method and apparatus for forming a photonic crystal
AssigneeHewlett-Packard Development Company, L.P.
InventorsJong-Souk Yeo, Henry D. Lewis
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Abstract
Embodiments of methods, apparatuses, devices, or systems for forming a photonic crystal are described.
Claims45
A photonic crystal, comprising:
- a material with a three-dimensional lattice arrangement of periodic submicron features formed therein spaced from each other in three orthogonal directions, at least a portion of the periodic features comprising internal surfaces forming a three-dimensional lattice arrangement of voids;
- and
- one or more thin films deposited on a substantial portion of the features, wherein at least a portion of the one or more thin films is deposited on the internal surfaces to a substantially uniform thickness.
A method, comprising:
- selectively removing one or more portions of a material by use of one or more holographic exposure processes and one or more developing processes to form a plurality of features spaced from each other in three orthogonal directions, at least a portion of the plurality of features comprising internal surfaces defining a lattice arrangement of voids;
- depositing one or more thin films on at least a portion of the features by use of one or more deposition processes to form at least a portion of a photonic device.
A method of manufacturing a photonic crystal, comprising:
- a step for selectively removing one or more portions of a photosensitive material by use of one or more holographic lithography processes to form one or more features of the photonic crystal, wherein the one or more features form voids and are spaced from one another in three orthogonal directions;
- a step for depositing one or more thin films on at least a portion of the one or more features by use of one or more atomic layer deposition processes.
A method comprising:
- forming a first material on a substrate;
- removing at least a portion of the first material from the substrate, by use of one or more holographic lithography processes, to form a three dimensional crystal structure having a lattice arrangement of features integral as a single unitary body and spaced from each other in three orthogonal directions, the features having internal surfaces forming a lattice arrangement of voids;
- depositing a second material on at least a portion of the internal surfaces by use of one or more atomic layer deposition (ALD) processes to form a film integrally extending as a single unitary body in three dimensions across the lattice arrangement of voids;
- and
- repeating the depositing step such as to form a plurality of thin films on at least a portion of the internal surfaces.
2 more elements
A method of making a photonic crystal, comprising the steps of:
- a) providing a substrate,
- b) forming a first material on the substrate,
- c) removing at least a portion of the first material from the substrate by use of one or more holographic lithography processes to form a three dimensional crystal structure having internal surfaces forming voids formed by features that are spaced from each other in three orthogonal directions,
- d) depositing a second material on at least a portion of the internal surfaces by use of one or more atomic layer deposition processes, and
- e) repeating the depositing step to form a plurality of thin films on at least a portion of the internal surfaces.
2 more elements
A photonic crystal, comprising:
- a material with a plurality of lithographically defined periodic features formed therein, at least a portion of the periodic features comprising internal surfaces;
- and one or more thin films deposited on a substantial portion of the features, wherein the one or more thin films is deposited on a substantial portion of the internal surfaces and wherein at least a portion of the one or more thin films is deposited on the internal surfaces to a substantially uniform thickness, wherein the material substantially comprises SU8, and wherein at least a portion of the one or more thin films substantially comprises W, formed to a substantially uniform thickness within the range of 2-5 Angstroms.
Dependencies are inferred from the claim text.